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Download Plasma Etching Fundamentals And Applications Series On Semiconductor Science And Technology

Plasma Etching: Fundamentals and Applications (Series on Semiconductor Science and Technology)

M. Sugawara

Format: Hardcover

Language: English

Pages: 362

Publisher: Oxford University Press (July 30, 1998)

ISBN: 019856287X

Format: PDF / Kindle / ePub

Size: 7.4 MB

Downloadable formats: PDF


This book focuses on the remarkable recent advances in understanding low pressure radio frequency glow discharges. It explains the basic analytical theory, plasma physics, and plasma diagnostics, before proceeding to the details of the etching process.

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