Plasma Etching: Fundamentals and Applications (Series on Semiconductor Science and Technology)
Publisher: Oxford University Press (July 30, 1998)
Format: PDF / Kindle / ePub
Size: 7.4 MB
Downloadable formats: PDF
This book focuses on the remarkable recent advances in understanding low pressure radio frequency glow discharges. It explains the basic analytical theory, plasma physics, and plasma diagnostics, before proceeding to the details of the etching process.